Studies of atomic and molecular fluorine reactions on silicon surfaces
X-ray photoelectron spectroscopy (XPS) and an ultrahigh vacuum compatible microwave discharge effusive beam source have been used to study the reactions of atomic and molecular fluorine on Si(111) surfaces. Fluorine uptake and changes in binding energy and peak shape for the Si 2p and F 1s XPS peaks have been measured as functions of fluorine exposure. The results indicate that molecular fluorine is dissociatively chemisorbed to form an SiF/sub 2/-like surface species. This reaction saturates at approximately one monolayer surface coverage. In contrast, atomic fluorine uptake extends well beyond the monolayer regime to include several Si layers. Additionally, as the uptake increases, the reaction product becomes SiF/sub 4/-like. These findings are compared with previously reported results for XeF/sub 2/ adsorption.
- Research Organization:
- Center for Chemical and Environmental Physics, Aerodyne Research, Inc., 45 Manning Road, Billerica, Massachusetts 01821
- OSTI ID:
- 6102058
- Journal Information:
- Appl. Phys. Lett.; (United States), Vol. 48:11
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
GENERAL PHYSICS
FLUORINE
CHEMICAL REACTIONS
CHEMISORPTION
COLLISIONS
SILICON
ATOM COLLISIONS
MOLECULE COLLISIONS
SORPTIVE PROPERTIES
SILICON FLUORIDES
SYNTHESIS
ADSORPTION
ATOMIC BEAMS
PHOTOELECTRON SPECTROSCOPY
SURFACE PROPERTIES
BEAMS
ELECTRON SPECTROSCOPY
ELEMENTS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HALOGENS
NONMETALS
SEMIMETALS
SEPARATION PROCESSES
SILICON COMPOUNDS
SORPTION
SPECTROSCOPY
640301* - Atomic
Molecular & Chemical Physics- Beams & their Reactions