Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films

Journal Article · Sat May 01 04:00:00 EDT 1993 · Chemistry of Materials; (United States)

DOI:https://doi.org/10.1021/cm00029a007· OSTI ID:6097683

Fix, R; Gordon, R G; Hoffman, D M ^[1]

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1. Univ. of Houston, TX (United States)

Vanadium, niobium, and tantalum nitride thin films were synthesized from homoleptic dialkylamido metal complexes and ammonia by atmospheric pressure chemical vapor deposition with high growth rates at low substrate temperatures (200-400[degrees]C). Depositions were successfully carried out on silicon, glass, vitreous carbon, and boron substrates. The films showed good adhesion to the substrates and were chemically resistant. The films were characterized by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, ellipsometry, and transmission electron microscopy. Reflectance and transmission spectra for the tantalum nitride films were also recorded. Hydrogen in the films was determined by hydrogen forward recoil scattering spectrometry. The vanadium nitride coatings were slightly nitrogen-rich VN (N/M ratio 1.05-1.15). They were polycrystalline as deposited and displayed metallic properties. The niobium nitride films had N/M ratios of 1.35 [plus minus] 0.05 and were golden colored by reflection and conducting. In contrast, the tantalum nitride films had N/M ratios of 1.7 [plus minus] 0.1 and were transparent, pale yellow colored in transmission and insulating. The stoichiometry and physical properties suggest that the films consist of Ta[sub 3]N[sub 5]. The hydrogen content of the films diminished as the deposition temperature increased, but all had significant amounts of hydrogen present. 26 refs., 5 figs., 4 tabs.

• DOE Contract Number: FG05-86ER75287
• OSTI ID: 6097683
• Journal Information: Chemistry of Materials; (United States), Journal Name: Chemistry of Materials; (United States) Vol. 5:5; ISSN CMATEX; ISSN 0897-4756
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
ABSORPTION SPECTROSCOPY
ADHESION
BACKSCATTERING
BORON
CARBON
CHEMICAL ANALYSIS
CHEMICAL COATING
CHEMICAL PREPARATION
CHEMICAL VAPOR DEPOSITION
COATINGS
DEPOSITION
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELEMENTS
ELLIPSOMETRY
FILMS
GLASS
MEASURING METHODS
MICROSCOPY
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
PHOTOELECTRON SPECTROSCOPY
PNICTIDES
REFRACTORY METAL COMPOUNDS
SCATTERING
SEMIMETALS
SILICON
SPECTROSCOPY
STOICHIOMETRY
SUBSTRATES
SURFACE COATING
SYNTHESIS
TANTALUM COMPOUNDS
TANTALUM NITRIDES
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSMISSION ELECTRON MICROSCOPY
VANADIUM COMPOUNDS
VANADIUM NITRIDES
X-RAY SPECTROSCOPY