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Transport and structural properties of Bi-Sr-Ca-Cu-oxide thin films prepared by reactive magnetron sputtering

Conference · · IEEE Trans. Magn.; (United States)
OSTI ID:6090284

Highly oriented superconducting thin films of Bi-Sr-Ca-Cu-oxides have been reproducibly prepared by reactive magnetically-enhanced triode sputtering using three separate metal targets (Sr, Ca, and Cu-Bi). The as-deposited films had composition ratios of Bi:Sr:Ca:Cu that were very close to either 2:2:1:2 or 2:2:2:3 as measured by Rutherford Backscattering Spectroscopy (RBS) with a relative accuracy of +- 5%. The films were deposited on SrTiO/sub 3/, MgO, CaF/sub 2/, Al/sub 2/O/sub 3/, and yttria stabilized zirconia (YSZ) substrates and had thicknesses of about 250 nm. After deposition, the films were annealed to 850 - 900/sup 0/C in various partial pressures of oxygen (0.05, 0.2, and 1 atm.). Films deposited on (100)SrTiO/sub 3/ and (100)MgO substrates showed little or no interaction with the substrate after annealing and are the primary focus of this paper. Significant substrate interaction and poor film quality were observed for films on CaF/sub 2/, Al/sub 2/O/sub 3/, and YSZ substrates. Reduced partial pressures of oxygen (0.05 and 0.2 atm.) generally gave the highest quality films for a given annealing cycle. The electrical resistance of the best 2212 films on MgO and SrTiO/sub 3/ decreased approximately linearly with temperature until the onset of superconductivity at about 85K. Zero resistance was achieved by 72K for our best 2212 films on MgO. X-ray diffraction demonstrated that the films were nearly single phase (Bi/sub 2/Sr/sub 2/Ca/sub 1/Cu/sub 2/O/sub 8 + x/) and highly textured with the c axis perpendicular to the substrate. Films prepared with the 2223 composition on SrTiO/sub 3/ showed significant (--20%) drops in resistance at 110K although zero resistance was not achieved until 75K.

Research Organization:
CMSE Post Doctoral (US); 3983000; 9501197; 9520459; 3968000
OSTI ID:
6090284
Report Number(s):
CONF-880812-
Journal Information:
IEEE Trans. Magn.; (United States), Journal Name: IEEE Trans. Magn.; (United States) Vol. 25:2; ISSN IEMGA
Country of Publication:
United States
Language:
English

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