Direct detection of vacuum ultraviolet radiation through an optical sampling orifice: analytical figures of merit for the nonmetals, metalloids, and selected metals by inductively coupled plasma atomic emission spectrometry
Journal Article
·
· Anal. Chem.; (United States)
Vacuum ultraviolet (vacuum UV) radiation can be readily observed through a sampling orifice inserted directly into an Ar inductively coupled plasma. Limits of detection are 50 ng mL/sup -1/ for the resonance lines of Br and Cl during injection into the plasma of aerosols of aqueous solutions generated by pneumatic nebulization. With ultrasonic nebulization, the detection limits improve to 8 ng mL/sup -1/ for Br and 15 ng mL/sup -1/ for Cl. Analytical calibration curves are linear over a range of 3.5-4 orders of magnitude in concentration. Each of the group IIIB (group 13 in 1985 notation) elements (Al, Ga, and In) possesses at least one intense line in the vacuum UV region that yields better limits of detection than the conventional ultraviolet lines typically observed. Emission signals from Br, Cl, and Al are not strongly affected by high concentrations of Na. The interference induced by Ca on Al emission (and vice versa) in the vacuum UV region is similar under this mode of observation to that describe in the literature for observation of the normal UV lines either axially or conventionally (i.e., from the side).
- Research Organization:
- Iowa State Univ., Ames
- DOE Contract Number:
- W-7405-ENG-82
- OSTI ID:
- 6087870
- Journal Information:
- Anal. Chem.; (United States), Journal Name: Anal. Chem.; (United States) Vol. 59:18; ISSN ANCHA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102* -- Chemical & Spectral Procedures
ALKALI METALS
ALKALINE EARTH METALS
ALUMINIUM
APPLE COMPUTERS
BROMINE
CALCIUM
CHEMICAL ANALYSIS
CHLORINE
COMPUTERIZED CONTROL SYSTEMS
COMPUTERS
CONTROL SYSTEMS
DATA
ELECTROMAGNETIC RADIATION
ELECTRONIC CIRCUITS
ELEMENTS
EMISSION SPECTROSCOPY
EXPERIMENTAL DATA
HALOGENS
INFORMATION
METALS
MICROELECTRONIC CIRCUITS
MICROPROCESSORS
NONMETALS
NUMERICAL DATA
PLASMA
QUANTITATIVE CHEMICAL ANALYSIS
RADIATIONS
SODIUM
SPECTROSCOPY
TRACE AMOUNTS
ULTRAVIOLET RADIATION
400102* -- Chemical & Spectral Procedures
ALKALI METALS
ALKALINE EARTH METALS
ALUMINIUM
APPLE COMPUTERS
BROMINE
CALCIUM
CHEMICAL ANALYSIS
CHLORINE
COMPUTERIZED CONTROL SYSTEMS
COMPUTERS
CONTROL SYSTEMS
DATA
ELECTROMAGNETIC RADIATION
ELECTRONIC CIRCUITS
ELEMENTS
EMISSION SPECTROSCOPY
EXPERIMENTAL DATA
HALOGENS
INFORMATION
METALS
MICROELECTRONIC CIRCUITS
MICROPROCESSORS
NONMETALS
NUMERICAL DATA
PLASMA
QUANTITATIVE CHEMICAL ANALYSIS
RADIATIONS
SODIUM
SPECTROSCOPY
TRACE AMOUNTS
ULTRAVIOLET RADIATION