Effects of rf on the sputtering rate of ICRH antenna components

Technical Report · Wed Jan 01 04:00:00 EST 1986

OSTI ID:6087176

Baity, F W; Hoffman, D J; Owens, T L; Ruzic, D N; Schechter, D E; Tsai, C C; Zerguini, T H

The sputtering rate of an ICRH loop antenna with a graphite-covered Faraday shield is being studied. The antenna is operated at 50 MHz and is exposed to an unmagnetized plasma produced by the High Particle Flux Facility. The flux at the antenna is on the order of 10/sup 17/ cm/sup -2/ s/sup -1/. A dc bias voltage is applied to the antenna, which allows the effective energy of the impinging hydrogen ions to be varied up to 200 eV. Rf power is being varied from 0 to 20 kW. The object of the experiment is to determine the sputtering rate of the shields and the antenna current strap as a function of incident particle energy and rf electric fields. The redeposition of sputtered particles is also studied. The report consists of viewgraphs.

• Research Organization: Oak Ridge National Lab., TN (USA)
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 6087176
• Report Number(s): DOE/OR/21400-T245; ON: DE86007564
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700205* -- Fusion Power Plant Technology-- Fuel
Heating
& Injection Systems
ANTENNAS
CARBON
CHARGED PARTICLES
COLLISIONS
ELECTRIC CONDUCTIVITY
ELECTRICAL EQUIPMENT
ELECTRICAL PROPERTIES
ELEMENTAL MINERALS
ELEMENTS
EQUIPMENT
GRAPHITE
HEATING
HIGH-FREQUENCY HEATING
HYDROGEN IONS
ICR HEATING
IONS
MINERALS
NONMETALS
PHYSICAL PROPERTIES
PLASMA HEATING
SPUTTERING