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Photolysis of polydimethylsiloxane by light at 147 and 123. 6 nm

Journal Article · · High Energy Chem. (Engl. Transl.); (United States)
OSTI ID:6083380
Mass spectrometry and optical absorption spectrometry in the wavelength interval 120-300 nm are used to study the photolysis of polydimethylsiloxane by light at 147 and 123.6 nm. The primary gaseous products are CH/sub 4/, H/sub 2/, and C/sub 2/H/sub 6/. During photolysis at 147 nm detachment of H atoms predominates and at 123.6 nm, detachment of H/sub 2/ molecules. The formation of cross links during photolysis causes suppression of the Rydberg transition bands n ..-->.. 3s and n ..-->.. 3p (lambda approx. = 175 nm) in the absorption band owing to a reduction in the intermolecular distances (photodensification of the polymer) and to a reduction in the efficiency of methane formation that is more rapid (by a factor of approx.5) than the release of methyl groups.
OSTI ID:
6083380
Journal Information:
High Energy Chem. (Engl. Transl.); (United States), Journal Name: High Energy Chem. (Engl. Transl.); (United States) Vol. 22:3; ISSN HIECA
Country of Publication:
United States
Language:
English