Experimental study of the electron density and discharge dynamics in a XeCl excimer laser
Journal Article
·
· Journal of Applied Physics; (USA)
- Department of Physics, The University of British Columbia, Vancouver, BC (Canada)
The temporal variation of the electron and current densities as well as the discharge voltage in a XeCl excimer laser discharge is studied as function of gas pressure and HCl+Xe concentration. The results show that independent of pressure and gas mix composition the electron drift velocity is a constant of {ital v}{sub {ital d}}=(1.2{plus minus}0.2){times}10{sup 6} cm s{sup {minus}1}. While in discharges containing only helium the current and electron density are independent of pressure {ital P}, both quantities vary as {ital P}{sup 0.6} once Xe and HCl have been added. The results are examined considering the most important atomic reaction rates.
- OSTI ID:
- 6079098
- Journal Information:
- Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 68:8; ISSN 0021-8979; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Density measurements of excited components in a longitudinal discharge excimer laser
Current density and pressure dependence of XeCl excimer fluorescence and laser emissions observed in a very small volume discharge
Electron-beam-controlled discharge XeCl excimer laser
Journal Article
·
Tue Jun 01 00:00:00 EDT 1993
· IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States)
·
OSTI ID:5614692
Current density and pressure dependence of XeCl excimer fluorescence and laser emissions observed in a very small volume discharge
Journal Article
·
Wed Sep 15 00:00:00 EDT 1982
· Appl. Phys. Lett.; (United States)
·
OSTI ID:5034232
Electron-beam-controlled discharge XeCl excimer laser
Journal Article
·
Mon May 15 00:00:00 EDT 1978
· Appl. Phys. Lett.; (United States)
·
OSTI ID:5093463
Related Subjects
42 ENGINEERING
426002* -- Engineering-- Lasers & Masers-- (1990-)
CHLORIDES
CHLORINE COMPOUNDS
CURRENT DENSITY
ELECTRIC DISCHARGES
ELECTRON DENSITY
EXCIMER LASERS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
INTERFEROMETRY
LASERS
PRESSURE DEPENDENCE
QUANTITY RATIO
RARE GAS COMPOUNDS
XENON CHLORIDES
XENON COMPOUNDS
426002* -- Engineering-- Lasers & Masers-- (1990-)
CHLORIDES
CHLORINE COMPOUNDS
CURRENT DENSITY
ELECTRIC DISCHARGES
ELECTRON DENSITY
EXCIMER LASERS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
INTERFEROMETRY
LASERS
PRESSURE DEPENDENCE
QUANTITY RATIO
RARE GAS COMPOUNDS
XENON CHLORIDES
XENON COMPOUNDS