Microstructure development in RuO sub 2 -glass thick-film resistors and its effect on the electrical resistivity

Journal Article · Sun Jul 01 00:00:00 EDT 1990 · Journal of the American Ceramic Society; (USA)

DOI:https://doi.org/10.1111/j.1151-2916.1990.tb05251.x· OSTI ID:6072176

Yamaguchi, T; Iizuka, K ^[1]

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1. Keio Univ., Yokohama (Japan). Faculty of Science and Technology

Microstructure development in RuO{sub 2}-glass thick-film resistors has been studied by optical microscopy with special emphasis on the effect of glass particle size and mixing and firing conditions. The microstructure development has been characterized by the coalescence of glass grains, infiltration of glass into RuO{sub 2} particle aggregates, and agglomeration of RuO{sub 2} particles. The resistivity-firing temperature relationship has been correlated with the microstructure development.

• OSTI ID: 6072176
• Journal Information: Journal of the American Ceramic Society; (USA), Journal Name: Journal of the American Ceramic Society; (USA) Vol. 73:7; ISSN JACTA; ISSN 0002-7820
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
360602 -- Other Materials-- Structure & Phase Studies
360603 -- Materials-- Properties
AGGLOMERATION
CHALCOGENIDES
CRYSTAL STRUCTURE
ELECTRICAL EQUIPMENT
ELECTRICAL PROPERTIES
EQUIPMENT
FABRICATION
GLASS
MICROSTRUCTURE
OXIDES
OXYGEN COMPOUNDS
PARTICLE SIZE
PHYSICAL PROPERTIES
REFRACTORY METAL COMPOUNDS
RESISTORS
RUTHENIUM COMPOUNDS
RUTHENIUM OXIDES
SIZE
TRANSITION ELEMENT COMPOUNDS