Large grain polycrystalline silicon films on graphite for solar cell applications

Conference · Tue May 01 04:00:00 EDT 1984 · Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)

OSTI ID:6070742

Kerber, M; Bettini, M; Gornik, E

Polycrystalline silicon layers are investigated on low cost graphite substrates. A closed space CVD deposition technique is used to deposit a highly doped Si-layer of 20 ..mu..m thickness on a polished graphite substrate. To improve the crystallize size the Si-film is recrystallized by means of a moving tungsten filament. The recrystallized silicon layer acts as a selective bulk contact and as a growing matrix for the active layer, which is deposited in a second CVD process. SIS-solar cells made with spray pyrolysis of SnO/sub 2/ give efficiencies between 7 and 9%.

• Research Organization: Institute for Experimental Physics, University of Innsbruck
• OSTI ID: 6070742
• Report Number(s): CONF-840561-
• Conference Information: Journal Name: Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
CARBON
CHALCOGENIDES
CHEMICAL REACTIONS
CRYSTAL GROWTH
CRYSTAL STRUCTURE
CRYSTALS
DECOMPOSITION
DEPOSITION
DIRECT ENERGY CONVERTERS
EFFICIENCY
ELECTRIC CONTACTS
ELECTRICAL EQUIPMENT
ELEMENTAL MINERALS
ELEMENTS
EQUIPMENT
FABRICATION
GRAIN SIZE
GRAPHITE
MICROSTRUCTURE
MINERALS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
POLYCRYSTALS
PYROLYSIS
RECRYSTALLIZATION
SEMIMETALS
SILICON
SILICON SOLAR CELLS
SIZE
SOLAR CELLS
SOLAR EQUIPMENT
SPRAY COATING
SUBSTRATES
SURFACE COATING
THERMOCHEMICAL PROCESSES
TIN COMPOUNDS
TIN OXIDES