Chemical characterization of a mixed (orthophosphoric/polyphosphoric) acid aluminum etchant

Conference · Mon Jan 01 04:00:00 EST 1979

OSTI ID:6067712

Win, H; Morin, T J

Sensitivity of an orthophosphoric acid, a polyphosphoric acid, and an iron (III) chloride etchant to variations in process conditions was examined to determine the potential production application of the etchant system in the photolithographic fabrication of pure aluminum circuits. The effects of changes in temperature, orthophosphoric acid concentration, polyphosphoric acid concentration, iron (III) chloride concentration, and dissolved aluminum concentration on etched circuit quality and etch rate were examined. The etchant system allows reasonable variation in preparation and circuit processing without drastically affecting the etched circuit quality. Control of the etchant can be maintained over a broad range of temperatures and compositions.

• Research Organization: Bendix Corp., Kansas City, MO (USA)
• DOE Contract Number: EY-76-C-04-0613
• OSTI ID: 6067712
• Report Number(s): BDX-613-2133; CONF-790618-1
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
ALUMINIUM
CABLES
CHEMICAL PROPERTIES
CHLORIDES
CHLORINE COMPOUNDS
CONDUCTOR DEVICES
DEPOSITION
ELECTRIC CABLES
ELECTRICAL EQUIPMENT
ELECTRONIC CIRCUITS
ELEMENTS
EQUIPMENT
ETCHING
FABRICATION
HALIDES
HALOGEN COMPOUNDS
HYDROGEN COMPOUNDS
INORGANIC ACIDS
IRON CHLORIDES
IRON COMPOUNDS
METALS
PHOSPHORIC ACID
PRINTED CIRCUITS
SENSITIVITY
SURFACE COATING
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS