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Composition distribution and magnetic characteristics of sputtered Permalloy films with substrate angle

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.576292· OSTI ID:6064590
Permalloy sputtered films for a thin magnetic head are deposited under precisely controlled conditions. The head pattern on a substrate shows not only a flat portion but also an inclined portion. The film characteristics on the inclined portions are important for a good thin-film head. Using a rf magnetron sputtering device with an 8-in. target, the angular distributions of sputtered Permalloy atoms (Ni and Fe), composition profile, and the magnetic characteristics were investigated. The results showed that the angular distributions of the Ni--Fe atoms depended on the rf power and were different from those of the cosine rule. A comparison of the film characteristics between the flat and inclined portions was carried out using a special substrate holder, in which nine glass substrates were fixed. The film thickness of the inclined portion differed, depending on the positions where the substrates were fixed. The coercive forces decreased with decreasing sputtering gas pressures, and those of thin films deposited on the inclined substrates were 20--50 A/m.
Research Organization:
Hitachi Research Laboratory, Hitachi, Ltd., Hitachi-shi, Ibaraki-ken 319-12, Japan
OSTI ID:
6064590
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:3; ISSN JVTAD
Country of Publication:
United States
Language:
English