Calibration of an argon in germanium standard using Rutherford backscattering spectrometry for energy dispersive x-ray spectroscopy
Journal Article
·
· J. Vac. Sci. Technol., A; (United States)
An argon standard for energy dispersive x-ray spectroscopy (EDS) has been made by bias sputtering hydrogenated amorphous germanium (/ital a/-Ge:H) films and determining the concentration of argon with Rutherford backscattering spectrometry. Varying concentrations of argon in hydrogenated amorphous germanium were achieved by changing the dc bias on the substrate holder and the gas pressure during rf magnetron sputtering onto a silicon substrate. It was found that standardless EDS analysis underestimates the argon concentration by about a factor of 2.
- Research Organization:
- Department of Nuclear Engineering, Phoenix Memorial Laboratory, The University of Michigan, Ann Arbor, Michigan 48109-2100(US); Energy Conversion Devices, Inc., Troy, Michigan 48084; Department of Nuclear Engineering, Phoenix Memorial Laboratory, The University of Michigan, Ann Arbor, Michigan 48109-2100
- OSTI ID:
- 6056842
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:4; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
440101 -- Radiation Instrumentation-- General Detectors or Monitors & Radiometric Instruments
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
656002* -- Condensed Matter Physics-- General Techniques in Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMORPHOUS STATE
ARGON
CALIBRATION STANDARDS
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
COATINGS
DEPOSITION
ELASTIC SCATTERING
ELEMENTS
ENERGY BEAM DEPOSITION FILMS
FILMS
FLUIDS
GASES
GERMANIUM
HYDROGENATION
IMPURITIES
MEASURING METHODS
METALS
NONMETALS
RARE GASES
RUTHERFORD SCATTERING
SCATTERING
SEMIMETALS
SILICON
SPUTTERING
STANDARDS
SUBSTRATES
THIN FILMS
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
656002* -- Condensed Matter Physics-- General Techniques in Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMORPHOUS STATE
ARGON
CALIBRATION STANDARDS
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
COATINGS
DEPOSITION
ELASTIC SCATTERING
ELEMENTS
ENERGY BEAM DEPOSITION FILMS
FILMS
FLUIDS
GASES
GERMANIUM
HYDROGENATION
IMPURITIES
MEASURING METHODS
METALS
NONMETALS
RARE GASES
RUTHERFORD SCATTERING
SCATTERING
SEMIMETALS
SILICON
SPUTTERING
STANDARDS
SUBSTRATES
THIN FILMS