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U.S. Department of Energy
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Epitaxial silicon growth for solar cells. Quarterly report No. 3, April 1--June 30, 1978

Technical Report ·
DOI:https://doi.org/10.2172/6051333· OSTI ID:6051333
The epitaxial growth of thin solar-cell structures was extended to include another potentially low-cost form of silicon: upgraded metallurgical grade silicon obtained from Dow Corning. An AM-1 efficiency of 12.4% was achieved with a cell structure having only 14 ..mu..m of silicon grown on the Dow Corning. The best efficiency obtained was 13% on a 50-..mu..m thick structure. It was found that titanium (2 x 10/sup 14/ A/cm/sup -3/ level) intentionally incorporated into the substrates primarily causes a reduction in the short-circuit current for both epitaxial and bulk cells. However, the epitaxial cells were much less effected by the presence of titanium and efficiencies as high as 11.7% were obtained while the efficiency for bulk cells was approx. 8%. Preliminary experiments in a laboratory model of RCA's advanced rotary disc reactor have produced solar cells with 10 to 12% efficiency. These cells were grown on single-crystal control substrates and the growth which included studies of submicron surface layers showed a trend toward increased short-circuit current density for shallower junctions.
Research Organization:
RCA Labs., Princeton, NJ (USA)
DOE Contract Number:
NAS-7-100-954817
OSTI ID:
6051333
Report Number(s):
DOE/JPL/954817-3
Country of Publication:
United States
Language:
English