Influence of electronic structure on XeF[sub 2] etching of silicon
Journal Article
·
· Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
- Department of Physics, University of California, Riverside, California 92521 (United States)
The work function and Fermi level pinning position of Si(111) exposed to XeF[sub 2] are measured with soft x-ray photoemission spectroscopy. The exposures range from the chemisorption of F on Si(111)-7[times]7 to steady-state etching. The work function increases monotonically with XeF[sub 2] exposure. The Fermi level is pinned near midgap after each exposure, but moves upwards towards the conduction band as the exposure is increased. The results are discussed in terms of the electronic structure of the surface reaction layer, and a chemical etching mechanism is proposed.
- DOE Contract Number:
- AC02-76CH00016
- OSTI ID:
- 6045429
- Journal Information:
- Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 11:4; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360606 -- Other Materials-- Physical Properties-- (1992-)
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
CHEMICAL BONDS
ELECTRONIC STRUCTURE
ELEMENTS
ENERGY LEVELS
ETCHING
FERMI LEVEL
FLUORIDES
FLUORINE COMPOUNDS
FUNCTIONS
HALIDES
HALOGEN COMPOUNDS
RARE GAS COMPOUNDS
SEMIMETALS
SILICON
SURFACE FINISHING
WORK FUNCTIONS
XENON COMPOUNDS
XENON FLUORIDES
360606 -- Other Materials-- Physical Properties-- (1992-)
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
CHEMICAL BONDS
ELECTRONIC STRUCTURE
ELEMENTS
ENERGY LEVELS
ETCHING
FERMI LEVEL
FLUORIDES
FLUORINE COMPOUNDS
FUNCTIONS
HALIDES
HALOGEN COMPOUNDS
RARE GAS COMPOUNDS
SEMIMETALS
SILICON
SURFACE FINISHING
WORK FUNCTIONS
XENON COMPOUNDS
XENON FLUORIDES