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Kinetic processes in electron beam-excited XeF(C. -->. A) laser media

Journal Article · · IEEE J. Quant. Electron.; (United States)
DOI:https://doi.org/10.1109/3.17344· OSTI ID:6044955
Fundamental processes affecting the operation and performance of electron beam- excited XeF (C..-->..A) laser media have been analyzed and modeled. Emphasis has been placed on conditions typical of high current density (..-->..250 A cm/sup -2/), short pulse (..-->..10 ns FWHM) e-beam excitation of high pressure (..-->..6 atm) multicomponent mixtures comprised of Ar-Kr-Xe-NF/sub 3/-F/sub 2/. Computation of the temporal evolution of excited and ionized species for such circumstances has permitted identification of the factors controlling XeF(C) formation and loss, and has resulted in the identification of the primary transient species that absorb radiation in the blue-green spectral region. The data so obtained serve to explain measured XeF(C..-->..A) properties, particularly net gain, under conditions for which the C ..-->.. A laser energy density and efficiency values are comparable to those of the UV XeF (B ..-->.. X) laser.
Research Organization:
United Technologies Research Center, East Hartford, CT (US)
OSTI ID:
6044955
Journal Information:
IEEE J. Quant. Electron.; (United States), Journal Name: IEEE J. Quant. Electron.; (United States) Vol. 25:4; ISSN IEJQA
Country of Publication:
United States
Language:
English