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Heterostructure semiconductor lasers prepared by molecular beam epitaxy

Journal Article · · IEEE J. Quant. Electron.; (United States)

--0.72-0.88 ..mu..m (AlGa)As, 1.3-1.65 ..mu..m GalnAsP and AlGaInAs, and 1.78 ..mu..m AlGaSb double-heterostructure (DH) lasers were prepared by molecular beam epitaxy. For AlGaAs DH lasers very low 300 K threshold current densities and long operating life (mean time to failure >10 h at 300 K) were achieved and optical transmitters containing MBE-grown lasers have been field-tested. For lasers with lasing wavelength >1 ..mu..m, MBE is in the development stage. The unique capabilities of MBE as an epitaxial growth technique and its important contributions to the field of optoelectronics are illustrated by a discussion of a new class of laser structures including quantum well heterostructure of GaAs/ Al Ga /SUB 1-x/ As and Ga /SUB 0.47/ In /SUB 0.53/ As/InP, double-barrier double-heterostructure lasers. These new lasers, made possible by MBE, have characteristics unmatched by conventional liquid phase epitaxial growth techniques.

Research Organization:
AT and T Bell Laboratories, Murray Hill, NJ 07974
OSTI ID:
6032223
Journal Information:
IEEE J. Quant. Electron.; (United States), Journal Name: IEEE J. Quant. Electron.; (United States) Vol. QE-20:10; ISSN IEJQA
Country of Publication:
United States
Language:
English