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Evidence from a hot atom experiment for the silylsilylene-to-disilene rearrangement: SiH/sub 3/SiH:. -->. SiH/sub 2/=SiH/sub 2/

Journal Article · · J. Phys. Chem.; (United States)
DOI:https://doi.org/10.1021/j100303a025· OSTI ID:6013960
Adducts of disilene (SiH/sub 2/=SiH/sub 2/) and silylsilylene (SiH/sub 3/SiH:) to butadiene have been found, in addition to the previously reported products from the reactions of recoiling silicon atoms in gaseous mixtures of phosphine (PH/sub 3/), butadiene (C-H/sub 2/=CH-CH=CH/sub 2/), and silane (SiH/sub 4/). The change in yields when neon moderator is present - the yield of the silylsilylene adduct increases while that of the disilene adduct decreases - is in accord with the formation of disilene via a silylsilylene intermediate. This is strong evidence for the rearrangement of silylsilylene to disilene: SiH/sub 3/SiH: ..-->.. SiH/sub 2/=SiH/sub 2/.
Research Organization:
Washington Univ., St. Louis, MO
OSTI ID:
6013960
Journal Information:
J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 91:19; ISSN JPCHA
Country of Publication:
United States
Language:
English