An Auger sputter profiling study of nitrogen and oxygen ion implantation in two titanium alloys

Conference · Sun Jan 01 04:00:00 EST 1989

DOI:https://doi.org/10.1002/sia.740150207· OSTI ID:6009566

Barton, B. D.; Pope, L. E.; Wittberg, T. N.

Samples of two titanium alloys, Ti-6Al-4V and Ti-15V-3Cr-3Sn-3Al, were ion implanted with a combination of nitrogen (N+) and oxygen (O+). For each alloy, implantation parameters were chosen to give implanted nitrogen concentrations of approximately 10 or 50 atomic percent, from a depth of 100 nanometers to a depth of 400 nanometers. In all but one case, dual energy (200 keV and 90 keV) implantations of nitrogen were used to give a relatively uniform nitrogen concentration to a depth of 300 nanometers. In each case, oxygen was implanted at 35 keV, following the nitrogen implantation, to give an oxygen-enriched region near the surface. The implanted samples were then examined by Auger electron spectroscopy (AES) combined with argon ion sputtering. In order to determine the stoichiometry of the nitrogen implanted regions, it was necessary to determine the N(KVV) contribution to the overlapping N(KVV) and Ti(LMM) Auger transitions. It was also necessary to correct for the ion-bombardment-induced compositional changes which have been described in an earlier study titanium nitride thin films. The corrected AES depth profiles were in good agreement with theoretical predictions. 18 refs., 6 figs., 2 tabs.

• Research Organization: EG and G Mound Applied Technologies, Miamisburg, OH (USA)
• DOE Contract Number: AC04-88DP43495
• OSTI ID: 6009566
• Report Number(s): MLM-3951(OP); CONF-8905167-1; ON: DE89014734
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102 -- Metals & Alloys-- Structure & Phase Studies
656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALLOYS
ALUMINIUM ALLOYS
AUGER ELECTRON SPECTROSCOPY
CHARGED PARTICLES
CHROMIUM ALLOYS
ELECTRON SPECTROSCOPY
FILMS
ION IMPLANTATION
IONS
NITRIDES
NITROGEN COMPOUNDS
NITROGEN IONS
OXYGEN IONS
PNICTIDES
SAMPLE PREPARATION
SPECTROSCOPY
SPUTTERING
THIN FILMS
TITANIUM ALLOYS
TITANIUM BASE ALLOYS
TITANIUM COMPOUNDS
TITANIUM NITRIDES
TRANSITION ELEMENT COMPOUNDS
VANADIUM ALLOYS