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U.S. Department of Energy
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Ion implantation of two titanium alloys

Technical Report ·
DOI:https://doi.org/10.2172/5841131· OSTI ID:5841131
Samples of two titanium alloys, Ti-6Al-4V and Ti-15V-3Cr-3Sn-3Al, were ion implanted with a combination of nitrogen (N/sup /plus//) and oxygen (O/sup /plus//). For each alloy, implantation parameters were chosen to give implanted nitrogen concentrations of approximately 10 atom % in one case and 50 atom % in another, from a depth of 100 nm to a depth of 400 nm. In all but one case, dual energy (200 keV and 90 keV) implantations of nitrogen were used to give a relatively uniform nitrogen concentration over a region of 300 nm. In each case, oxygen was implanted at 35 keV, following the nitrogen implantation, to give an oxygen-enriched region near the surface. The implanted samples were examined by optical microscopy and by Auger electron spectroscopy (AES). Depth profiles, determined by AES combined with argon ion sputtering, were in good agreement with theoretical predictions. Experimental observations were consistent with the formation of a solid solution of nitrogen in a titanium alloy phase in the case of alloys implanted to a level of 10 atom %; and compound formation was indicated in the case of alloys implanted to a level of 50 atom %. 20 refs.
Research Organization:
EG and G Mound Applied Technologies, Miamisburg, OH (USA)
DOE Contract Number:
AC04-88DP43495
OSTI ID:
5841131
Report Number(s):
MLM-3603; ON: DE89016958
Country of Publication:
United States
Language:
English