Investigation of the hydrochlorination of SiCl/sub 4/. Flat plate solar-array project: advanced materials research task. Final report, July 9, 1981-April 8, 1983
A research and development program was carried out to study the hydrochlorination reaction over a wide range of reaction conditions. Equilibrium constant and reaction kinetics measurements were made to provide the basis for a theoretical study on the hydrochlorination process. Thermodynamic properaties of the hydrochlorination reaction were also measured. The effects of temperature, pressure and concentration on the equilibrium constant, K/sub p/, were studied. Reaction kinetics measurements on the hydrochlorination of SiCl/sub 4/ and mg silicon metal were carried out over a wide range of temperature, pressure and concentration. Theoretical treatment of the experimental rate data showed that the hydrochlorination reaction followed a pseudo-first order kinetics. The mechanism of the hydrochlorination reaction was also investigated. A small quartz reactor was constructed to study the deuterium kinetics isotope effects. The reaction rates for the hydrochlorination of SiCl/sub 4/ and mg silicon metal in the presence of hydrogen and deuterium were measured under identical reaction conditions. Results showed that no significant deuterium kinetics effects were observed. This suggested that hydrogen is not directly involved in the rate-determining step. A plausible reaction mechanism for the hydrochlorination reaction is proposed. A corrosion study was carried out to evaluate various materials of construction for the hydrochlorination reactor at 500/sup 0/C and 300 psig. Results showed that a silicide protective film was formed on the metal surface. Analyses of the test samples by Scanning Electron Microscopy showed the diffusion of silicon into the base metal. A plausible corrosion mechanism of metals and alloys under the hydrochlorination reaction environment is proposed.
- Research Organization:
- Solarelectronics, Inc., Bellingham, MA (USA)
- DOE Contract Number:
- NAS-7-100-956061
- OSTI ID:
- 6009416
- Report Number(s):
- DOE/JPL/956061-7; ON: DE83015173
- Country of Publication:
- United States
- Language:
- English
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Flat-plate solar array project. Task I. Silicon material: investigation of the hydrochlorination of SiCL/sub 4/. Quarterly report, April 9, 1982-July 8, 1982
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Flat-Plate Solar Array Project. Task I. Silicon material. Investigation of the hydrochlorination of SiCl/sub 4/. Second quarterly report, October 1, 1981-January 8, 1982
Technical Report
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Mon Jul 12 00:00:00 EDT 1982
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OSTI ID:5087154
Flat-plate solar-array project silicon material task. Task I. Silicon material. Investigation of the hydrochlorination of SiCl/sub 4/. Fifth quarterly report, July 9-October 8, 1982
Technical Report
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Fri Oct 15 00:00:00 EDT 1982
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OSTI ID:6981627
Flat-Plate Solar Array Project. Task I. Silicon material. Investigation of the hydrochlorination of SiCl/sub 4/. Second quarterly report, October 1, 1981-January 8, 1982
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Fri Jan 08 23:00:00 EST 1982
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Related Subjects
14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
ARRHENIUS EQUATION
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMICAL REACTORS
CHLORIDES
CHLORINE COMPOUNDS
COATINGS
CORROSION
DATA
DIFFUSION
EQUATIONS
EXPERIMENTAL DATA
HALIDES
HALOGEN COMPOUNDS
HYDRIDES
HYDROGEN COMPOUNDS
INFORMATION
KINETICS
NUMERICAL DATA
PHYSICAL PROPERTIES
PROTECTIVE COATINGS
REACTION KINETICS
SILANES
SILICON CHLORIDES
SILICON COMPOUNDS
THERMODYNAMIC PROPERTIES
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
ARRHENIUS EQUATION
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMICAL REACTORS
CHLORIDES
CHLORINE COMPOUNDS
COATINGS
CORROSION
DATA
DIFFUSION
EQUATIONS
EXPERIMENTAL DATA
HALIDES
HALOGEN COMPOUNDS
HYDRIDES
HYDROGEN COMPOUNDS
INFORMATION
KINETICS
NUMERICAL DATA
PHYSICAL PROPERTIES
PROTECTIVE COATINGS
REACTION KINETICS
SILANES
SILICON CHLORIDES
SILICON COMPOUNDS
THERMODYNAMIC PROPERTIES