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Pressure-dependent electron attachment and breakdown strengths of unary gases and synergism of binary gas mixtures: A relationship

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.334598· OSTI ID:5994939
The relationship between the pressure-dependent electron attachment rate constants which have been observed in 1-C/sub 3/F/sub 6/ and in several perfluoroalkanes and the uniform field breakdown strengths (E/N)/sub lim/ in these gases is discussed. Also discussed are the various types of synergistic behavior in (E/N)/sub lim/ which have been observed in binary dielectric gas mixtures. For the latter, a new mechanism is outlined which explains the synergism observed in several gas mixtures where the (E/N)/sub lim/ values of the mixtures are greater than those of the individual gas constituents, which we call positive synergism. Model calculations are presented which support this mechanism and can be used to explain the pressure-dependent synergistic effects which have been reported in 1-C/sub 3/F/sub 6//SF/sub 6/ and other gas mixtures. Experimentally observed ion--molecule reaction processes for several gases are discussed which support the proposed mechanism. Based on this mechanism, we outline several conditions which must be fulfilled in order to observe positive synergistic behavior in dielectric gas mixtures.
Research Organization:
Atomic, Molecular, and High Voltage Physics Group, Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
DOE Contract Number:
AC05-84OR21400
OSTI ID:
5994939
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 57:9; ISSN JAPIA
Country of Publication:
United States
Language:
English