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Pressure-dependent electron attachment rates in perfluoroalkanes and perfluoropropylene (1-C/sub 3/F/sub 6/) and their effect on the breakdown strength of these gases

Conference ·
OSTI ID:5287760
The pressure dependence of the attachment rate constant of several perfluoroalkane dielectrics has been studied in buffer gases of N/sub 2/ and Ar up to a total pressure of 2.4 MPa. It has been observed that the higher order perfluoroalkanes (n-C/sub N/F/sub 2N+2/; 3 less than or equal to N less than or equal to 6) exhibit a marked dependence of their attachment rate constant on the total gas pressure, particularly in the pressure range from 53 kPa to approx. 700 kPa in N/sub 2/ over a mean energy range of from thermal energy to approx. = 1 eV, and in Ar over the energy range from approx. = 0.3 eV to approx. = 4.5 eV. A considerably larger total pressure dependence has been observed for 1-C/sub 3/F/sub 6/ in N/sub 2/ and Ar, which does not saturate, even at the highest buffer gas pressures (3.2 MPa). A partial pressure dependence of the attachment rate on 1-C/sub 3/F/sub 6/ has also been observed in these mixtures, which may saturate above approx. 15 kPa, indicating that the attachment process involves the interaction of two or more 1-C/sub 3/F/sub 6/ molecules. Breakdown measurements have been performed in 1-C/sub 3/F/sub 6/ using uniform field electrodes and in mixtures of 1-C/sub 3/F/sub 6//N/sub 2/ and 1-C/sub 3/F/sub 6//SF/sub 6/ using point-plane electrodes. These measurements have been performed over the total pressure range 25 to 600 kPa. The dc breakdown strength of 1-C/sub 3/F/sub 6/ is dependent on the total gas pressure after allowing for the effect of compressibility of the gas. Our attachment and breakdown measurements for these gases and gas mixtures are reported and discussed.
Research Organization:
Oak Ridge National Lab., TN (USA)
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
5287760
Report Number(s):
CONF-820331-2; ON: DE82008848
Country of Publication:
United States
Language:
English