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Mechanistic studies of copper thin-film growth from Cu[sup I] and Cu[sup II] [beta]-diketonates

Journal Article · · Journal of the American Chemical Society; (United States)
DOI:https://doi.org/10.1021/ja00056a028· OSTI ID:5988628
;  [1];  [2]
  1. Univ. of Illinois, Urbana (United States)
  2. AT T Bell Lab., Murray Hill, NJ (United States)
The kinetics and mechanism of copper film growth from the reactions of bis(acetylacetonato)copper(II), bis(hexafluoroacetylacetonato)copper(II), and (vinyltrimethylsilane)(hexafluoroacetylacetonato)copper(I) (Cu(hfac)(vtms)) with copper single crystal surfaces were investigated. Experiments were performed using vibrational spectroscopy (reflection infrared and high-resolution electron energy loss spectroscopies) as well as mass spectrometry (temperature-programmed desorption and integrated desorption mass spectrometries). Both ligand desorption and dissociation were observed upon pyrolysis of these molecules under ultra-high-vacuum conditions. The authors demonstrate that adsorbed [beta]-diketonate ligands decompose in a stepwise fashion at temperatures above [approximately] 375 K to yield adsorbed CF[sub 3] and ketenylidene ([triple bond]C-C[triple bond]O) intermediates. These further decompose above [approximately] 500 K to leave surface carbon, a major contaminant in copper films grown from Cu[sup II] [beta]-diketonates. Clean films can be grown from the pyrolysis of Cu(hfac)(vtms) at pressures above 10[sup [minus]5] Torr, however. The implications of the results relative to the mechanism of copper film growth at elevated pressures are also discussed. 54 refs., 14 figs., 2 tabs.
DOE Contract Number:
FG02-91ER45439
OSTI ID:
5988628
Journal Information:
Journal of the American Chemical Society; (United States), Journal Name: Journal of the American Chemical Society; (United States) Vol. 115:3; ISSN JACSAT; ISSN 0002-7863
Country of Publication:
United States
Language:
English