Evaluation of the gas puff z pinch as an x-ray lithograhy and microscopy source

Journal Article · Fri Jan 01 04:00:00 EST 1982 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.92908· OSTI ID:5948228

Bailey, J; Ettinger, Y; Fisher, A; Feder, R

Soft x rays (100--10 000 eV), due to their short wavelength (0.1--10 nm) can play an important role in high resolution microscopy and lithography. The gas puff Z pinch is an intense source of soft x rays. Calorimeter and x ray diode measurements showed that 10% of the stored electrical energy was converted to radiation in the range of 1--10 nm. Commercial photoresist polymethyl methacrylate (PMMA) and some new resists: CR 39, nitrocellulose, were exposed to the pinch radiation. The developed images on the resists have been studied with a scanning electron microscope. The resolution was found to be source limited, but a simple modification can improve the resolution by more than an order of magnitude.

• Research Organization: Department of Physics University of California, Irvine, California 92717
• OSTI ID: 5948228
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 40:1; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700108* -- Fusion Energy-- Plasma Research-- Wave Phenomena
CALORIMETRY
CARBOHYDRATES
CARBOXYLIC ACID SALTS
CELLULOSE ESTERS
CHEMICAL EXPLOSIVES
DATA
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
ENERGY
EQUIPMENT
ESTERS
EXPLOSIVES
FLUIDS
GASES
INFORMATION
IONIZING RADIATIONS
LINEAR PINCH DEVICES
LINEAR Z PINCH DEVICES
METHACRYLATES
MICROSCOPY
NITRIC ACID ESTERS
NITROCELLULOSE
OPEN PLASMA DEVICES
ORGANIC COMPOUNDS
PINCH DEVICES
POLYMERS
POLYSACCHARIDES
RADIATION SOURCES
RADIATIONS
SACCHARIDES
SCANNING ELECTRON MICROSCOPY
SOFT X RADIATION
THERMONUCLEAR DEVICES
WAVELENGTHS
X RADIATION
X-RAY EQUIPMENT
X-RAY SOURCES