Evaluation of the gas puff z pinch as an x-ray lithograhy and microscopy source
Soft x rays (100--10 000 eV), due to their short wavelength (0.1--10 nm) can play an important role in high resolution microscopy and lithography. The gas puff Z pinch is an intense source of soft x rays. Calorimeter and x ray diode measurements showed that 10% of the stored electrical energy was converted to radiation in the range of 1--10 nm. Commercial photoresist polymethyl methacrylate (PMMA) and some new resists: CR 39, nitrocellulose, were exposed to the pinch radiation. The developed images on the resists have been studied with a scanning electron microscope. The resolution was found to be source limited, but a simple modification can improve the resolution by more than an order of magnitude.
- Research Organization:
- Department of Physics University of California, Irvine, California 92717
- OSTI ID:
- 5948228
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 40:1; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
700108* -- Fusion Energy-- Plasma Research-- Wave Phenomena
CALORIMETRY
CARBOHYDRATES
CARBOXYLIC ACID SALTS
CELLULOSE ESTERS
CHEMICAL EXPLOSIVES
DATA
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
ENERGY
EQUIPMENT
ESTERS
EXPLOSIVES
FLUIDS
GASES
INFORMATION
IONIZING RADIATIONS
LINEAR PINCH DEVICES
LINEAR Z PINCH DEVICES
METHACRYLATES
MICROSCOPY
NITRIC ACID ESTERS
NITROCELLULOSE
OPEN PLASMA DEVICES
ORGANIC COMPOUNDS
PINCH DEVICES
POLYMERS
POLYSACCHARIDES
RADIATION SOURCES
RADIATIONS
SACCHARIDES
SCANNING ELECTRON MICROSCOPY
SOFT X RADIATION
THERMONUCLEAR DEVICES
WAVELENGTHS
X RADIATION
X-RAY EQUIPMENT
X-RAY SOURCES