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0. 1-/mu/m gate-length superconducting FET

Journal Article · · IEEE Electron Device Lett.; (United States)
DOI:https://doi.org/10.1109/55.32429· OSTI ID:5940988
A superconducting field-effect transistor (FET) with a 0.1-/mu/m-length gate electrode was fabricated and tested at liquid-helium temperature. Two superconducting electrodes (source and drain) were formed on the same Si substrate surface with an oxide-insulated gate electrode by a self-aligned fabrication process. Superconducting current flowing through the semiconductor (Si) between the two superconducting electrodes (Nb) was controlled by a gate-bias voltage.
Research Organization:
Hitachi Ltd., Kokubunji, Tokyo (Japan). Central Research Lab.
OSTI ID:
5940988
Journal Information:
IEEE Electron Device Lett.; (United States), Journal Name: IEEE Electron Device Lett.; (United States) Vol. 10:2; ISSN EDLED
Country of Publication:
United States
Language:
English