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U.S. Department of Energy
Office of Scientific and Technical Information

Apertured and unapertured reflector structures for electroluminescent devices

Patent ·
OSTI ID:5933876
A multilayered reflector structure is disclosed that is deposited on the light emitting surface of a semiconductor electroluminescent device and consecutively comprising a layer of low refractive index material, a layer of intermediate refractive index material and a layer of high refractive index material. Ablative means remove and form an aperture in the outer high index layer at the region of optical radiation emission from said device whereby the level of reflectivity is highest at the center of the aperture as compared to structure regions adjacent to the aperture. In this manner, fundamental mode stabilization may be achieved. Also disclosed is a nonablated three layered reflector structure.
Assignee:
Xerox Corp
Patent Number(s):
US 4280107
OSTI ID:
5933876
Country of Publication:
United States
Language:
English