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Capacitance measurements on silicon microstrip detectors

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:5923077
 [1];  [2];  [3]; ;  [4]
  1. INFN, Milano (Italy) CERN, Geneva (Switzerland)
  2. INFN, Padova (Italy)
  3. SEFT, Helsinki (Finland)
  4. Imperial Coll., London (United Kingdom)
Load capacitance is the most significant parameter determining the noise level of charge-sensitive readout electronics. This is the capacitance between the detecting electrode and all other conductors in the system. For the case of silicon microstrip detectors, the significant contributions are those from the other strips on the detector surface and also from the backplane. This article presents the results of capacitance measurements on both the junction and ohmic sides of detectors, and with various geometries. Double-sided detectors with a second metal layer and different readout patterns were also studied. In addition, the authors present measurements of microstrip capacitance after irradiation with both neutrons and photons made as part of the research by the RD20 collaboration into all aspects of the use of silicon microstrips at the Large Hadron Collider at CERN.
OSTI ID:
5923077
Report Number(s):
CONF-921005--
Conference Information:
Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Journal Volume: 40:4 part 1
Country of Publication:
United States
Language:
English

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