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Microlithography of high-temperature superconducting films

Conference · · IEEE Trans. Magn.; (United States)
OSTI ID:5919760
Narrow lines and microbridge structures have been etched in sputtered superconducting films of Y-Ba-Cu-O by variations of two methods. The first uses standard photolithography followed by wet etching in weak acid. The second uses a maskless process involving a focused pulsed YAG laser together with a computer-controlled x-y stage to produce local ablation of the superconducting film. Issues relating to limits of resolution, annealing of films, and degradation of superconducting properties are critically discussed for the two approaches.
Research Organization:
Dept. of Electrical Engineering, Univ. of Rochester, Rochester, NY (US); Lab. for Laser Energetics, Univ. of Rochester, Rochester, NY (US)
OSTI ID:
5919760
Report Number(s):
CONF-880812-
Conference Information:
Journal Name: IEEE Trans. Magn.; (United States) Journal Volume: 25:2
Country of Publication:
United States
Language:
English

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