Multicusp sources for ion beam projection lithography

Journal Article · Sun Feb 01 04:00:00 EST 1998 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.1148469· OSTI ID:591907

Lee, Y; Gough, R A; Kunkel, W B; Leung, K N; Vujic, J; Williams, M D; Wutte, D; Zahir, N ^[1]

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1. Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720 (United States)

Multicusp ion sources are capable of producing positive and negative ions with good beam quality and low energy spread. The ion energy spread of multicusp sources has been measured by three different techniques. The axial ion energy spread has been reduced by introducing a magnetic filter inside the multicusp source chamber which adjusts the plasma potential distribution. The axial energy spread is further reduced by optimizing the source configuration. Values as low as 0.8 eV have been achieved. {copyright} {ital 1998 American Institute of Physics.}

• OSTI ID: 591907
• Report Number(s): CONF-980145--
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 2 Vol. 69; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
CUSPED GEOMETRIES
DESIGN
ENERGY SPECTRA
ION BEAMS
ION SOURCES
PLASMA PRODUCTION