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Low-energy electron diffraction and photoemission study of epitaxial films of Cu on Ag l brace 001 r brace

Journal Article · · Physical Review, B: Condensed Matter; (USA)
; ; ; ;  [1];  [2]
  1. College of Engineering and Applied Science, State University of New York, Stony Brook, New York 11794 (US)
  2. IBM Research Center, P.O. Box 218, Yorktown Heights, New York 10598 (USA)
The epitaxy of Cu on Ag{l brace}001{r brace} is studied by qualitative and quantitative low-energy electron diffraction (LEED) and by angle-resolved photoemission. LEED indicates that ultrathin (two- to three-atomic-layer) films have a limited amount of long-range order, and the ordered component has interlayer spacings of 1.45{plus minus}0.06 A, which compares well with the theoretically determined cubic lattice constant 2.87{plus minus}0.06 A of a metastable body-centered-cubic (bcc) modification of Cu. Thicker (10- to 12-layer) films have almost no long-range order, and photoemission indicates that regions of bcc and fcc Cu coexist amid large amounts of defects.
DOE Contract Number:
FG02-86ER45239
OSTI ID:
5889748
Journal Information:
Physical Review, B: Condensed Matter; (USA), Journal Name: Physical Review, B: Condensed Matter; (USA) Vol. 43:8; ISSN 0163-1829; ISSN PRBMD
Country of Publication:
United States
Language:
English

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