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Molecular beam epitaxy-grown PbSnTe-PbEuSeTe buried heterostructure diode lasers

Journal Article · · IEEE Photonics Technology Letters (Institute of Electrical and Electronics Engineers); (USA)
DOI:https://doi.org/10.1109/68.62010· OSTI ID:5883565
; ; ;  [1]
  1. Laser Photonics Analytics Div., Bedford, MA (US)

This paper reports on buried heterostructure (BH) PbSnTe-PbEuSeTe lasers with a PbSnTe active layer fabricated for the first time using a two stage molecular beam epitaxy (MBE) growth procedure. Lasers with 4 {mu}m wide and 0.65 {mu}m thick buried Pb{sub 0.961}Sn{sub 0.039}Te active layer and Pb{sub 0.985}Eu{sub 0.015}Se{sub 0.02}Te{sub 0.98} cladding layers were grown. Continuous wave (CW) operating temperature of 175 K was measured with cw threshold currents of 1.6 mA (20 K), 13.6 mA (80 K), and 195 mA (160 K). Single mode operation with 3.0 cm{sup {minus}1} mode tuning was measured at 1639.8 cm{sup {minus}1} emission.

OSTI ID:
5883565
Journal Information:
IEEE Photonics Technology Letters (Institute of Electrical and Electronics Engineers); (USA), Journal Name: IEEE Photonics Technology Letters (Institute of Electrical and Electronics Engineers); (USA) Vol. 2:12; ISSN IPTLE; ISSN 1041-1135
Country of Publication:
United States
Language:
English