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Source of sup 17 O hyperfine broadening of the P sub b resonance associated with the (111) Si-SiO sub 2 interface

Journal Article · · Physical Review, B: Condensed Matter; (USA)
 [1]
  1. Sandia National Laboratory, Albuquerque, NM (USA)
The {ital P}{sub {ital b}} center is primarily a silicon dangling-bond type of defect at the (111) Si-SiO{sub 2} interface that is observable with electron paramagnetic resonance (EPR). Dry oxidation at 750 {degree}C of (111) silicon with O{sub 2} enriched with {sup 17}O ({ital I}=5/2) to 51.26% is observed by EPR to significantly increase the linewidth of the {ital P}{sub {ital b}} resonance at {ital g}=2.0016. In this paper, we show that the source of this line broadening is due to {sup 17}O superhyperfine interactions with {sup 17}O in the oxide. Furthermore, our EPR measurements indicate that the microscopic concentration of {sup 17}O absorbed and diffused into the silicon adjacent to the interface is insufficient to make a detectable contribution to the {sup 17}O superhyperfine broadening.
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5875411
Journal Information:
Physical Review, B: Condensed Matter; (USA), Journal Name: Physical Review, B: Condensed Matter; (USA) Vol. 42:17; ISSN PRBMD; ISSN 0163-1829
Country of Publication:
United States
Language:
English