Vacuum deposited polycrystalline silicon films for solar cell applications. Quarterly technical progress report No. 1, September 29-December 31, 1978
A vacuum deposition technique for forming polycrystalline silicon solar cells is being explored. Transition metal diboride layers, being examined as the cell's bottom electrode, were deposited on single crystal (sapphire) and polycrystalline (alumina) Al/sub 2/O/sub 3/ substrates. Graphite substrates were also examined. Boron doped p-type silicon layers were formed by co-deposition in the vacuum at substrate temperature between 1100/sup 0/C and 1200/sup 0/C. Silicon grain size in the films was between 4 ..mu..m and 6 ..mu..m depending on the deposition conditions (supersaturation ratio). The n-type silicon layer was formed by gaseous diffusion into the p-type layer. Detailed secondary-ion mass spectra analysis of silicon, metal borides and substrates was carried out. The most satisfactory devices used TiB/sub 2/ electrodes on alumina substrates. Solar cell AM 2 efficiencies of 1.8% were about the same as the planar cells formed previously by double-diffusion.
- Research Organization:
- Johns Hopkins Univ., Laurel, MD (USA). Applied Physics Lab.
- OSTI ID:
- 5868225
- Report Number(s):
- SAN-2208-T1
- Country of Publication:
- United States
- Language:
- English
Similar Records
Vacuum-deposited polycrystalline silicon films for solar-cell applications. Final technical report, September 14, 1979-December 1, 1980
Vacuum deposited polycrystalline silicon films for solar cell applications. Final report, 29 September 1978-30 September 1979
Related Subjects
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
BORON
CARBON
CHALCOGENIDES
CHEMICAL COMPOSITION
COHERENT SCATTERING
CRYSTAL DOPING
CRYSTAL STRUCTURE
CRYSTALS
DEPOSITION
DIFFRACTION
DIFFUSION
DIFFUSION LENGTH
DIRECT ENERGY CONVERTERS
EFFICIENCY
ELEMENTS
FABRICATION
FILMS
GRAIN SIZE
GRAPHITE
HEATING
IMPURITIES
LASER-RADIATION HEATING
MASS SPECTROSCOPY
MICROSTRUCTURE
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PERFORMANCE
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PLASMA HEATING
POLYCRYSTALS
RECRYSTALLIZATION
SCATTERING
SEMIMETALS
SILICON
SILICON SOLAR CELLS
SIZE
SOLAR CELLS
SPECTRAL RESPONSE
SPECTROSCOPY
SUBSTRATES
SURFACE COATING
VACUUM COATING
X-RAY DIFFRACTION