Transient refractive index measurements in XeF laser gas mixtures

Journal Article · Mon May 01 00:00:00 EDT 1989 · IEEE J. Quant. Electron.; (United States)

DOI:https://doi.org/10.1109/3.27986· OSTI ID:5851709

Fulghum, S F; Trainor, D; Appel, C

Transient refractive index (TRI) measurements have been made in e-beam-pumped, XeF laser gas mixtures as a function of energy loading. Both NF/sub 3/ and F/sub 2/ were used as halogen donors in a neon base. TRI due to halogen donor burnup and to plasma dispersion was measured at 578.4 nm in typical laser mixtures containing Xe and at 353.2 nm in mixtures without Xe. The net index of refraction of the mixtures decreased with increasing energy loading, resulting in a difference of about 50 x 10/sup -9/ to 100 x 10/sup -9/ between a pumped and unpumped region at a typical loading of 150 J/I.

• Research Organization: Science Research Lab., Inc., Somerville, MA (USA); Avco-Everett Research Lab., Everett, MA (USA)
• OSTI ID: 5851709
• Journal Information: IEEE J. Quant. Electron.; (United States), Journal Name: IEEE J. Quant. Electron.; (United States) Vol. 25:5; ISSN IEJQA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
BEAMS
DISPERSIONS
ELECTRON BEAMS
ELEMENTS
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
GASES
HALIDES
HALOGEN COMPOUNDS
LASERS
LEPTON BEAMS
MEASURING METHODS
MIXTURES
NEON
NONMETALS
OPTICAL PROPERTIES
OPTICAL PUMPING
PARTICLE BEAMS
PHYSICAL PROPERTIES
PUMPING
RARE GAS COMPOUNDS
RARE GASES
REFRACTIVITY
XENON COMPOUNDS
XENON FLUORIDES