Glass etching initiated by excimer laser photolysis of CF/sub 2/Br/sub 2/

Journal Article · Thu Apr 24 04:00:00 EST 1986 · J. Phys. Chem.; (United States)

DOI:https://doi.org/10.1021/j100400a011· OSTI ID:5850633

Brannon, J H

KrF and ArF excimer laser irradiation of glass surfaces immersed in gaseous CF/sub 2/Br/sub 2/ is found to induce etching. The etch mechanism is considered to be nonthermal on the basis of the small value of the glass absorption coefficent and wavelength variable etching experiments. The etch rate dependence on surface fluence is presented for three pressures. SEM photos reveal a rough surface morphology in the etched region that apparently is not a chemical effect but results solely from the laser irradiation. Photochemical and spectroscopic analysis of the irradiated gas provides evidence for CF/sub 2/ and CF/sub 2/Br as being major photolysis products. C/sub 2/F/sub 4/ was also found to cause etching at 248 and 193 nm. This is evidence that CF/sub 2/, resulting from C/sub 2/F/sub 4/ photolysis, is alone capable of initiating glass etching in the presence of laser light. The paper concludes by discussing the observed inability of the CF/sub 3/ releasing parent gases CF/sub 3/Br and CF/sub 3/I to significantly etch glass when irradiated in their appropriate absorption bands. 31 references, 9 figures, 1 table.

• Research Organization: IBM General Technology Div., Hopewell Junction, NY
• OSTI ID: 5850633
• Journal Information: J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 90:9; ISSN JPCHA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400500 -- Photochemistry
BOROSILICATE GLASS
CHEMICAL REACTIONS
DATA
DECOMPOSITION
ELECTRON MICROSCOPY
ETCHING
EXCIMER LASERS
EXPERIMENTAL DATA
GAS LASERS
GLASS
INFORMATION
LASERS
MICROSCOPY
NUMERICAL DATA
ORGANIC BROMINE COMPOUNDS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOLYSIS
SCANNING ELECTRON MICROSCOPY
SURFACE FINISHING