Mechanisms for power deposition in Ar/SiH/sub 4/ capacitively coupled RF discharges
Journal Article
·
· IEEE Trans. Plasma Sci.; (United States)
OSTI ID:5850626
In low-pressure capacitively coupled parallel-plate radio-frequency (RF) discharges, such as those used in plasma processing of semiconductor materials, power deposition and the rate of electron-impact excitation collisions depend upon time during the RF cycle and position in the discharge. Power is coupled into the discharge in at least two ways: by way of a high-energy ''e-beam'' component of the electron distribution resulting from electrons falling through or being accelerated by the oscillating sheaths, and by ''joule heating'' in the body of plasma. This paper discusses the method of power deposition by electrons and the spatial dependence of electron-impact excitation rates in low-pressure capacitively coupled RF discharges with results from a Monte Carlo plasma simulation code. Mixtures of argon and silane are examined as typical examples of discharges used for the plasma deposition of amorphous silicon.
- Research Organization:
- Spectra Technology, Inc., Bellevue, WA 98004
- OSTI ID:
- 5850626
- Journal Information:
- IEEE Trans. Plasma Sci.; (United States), Journal Name: IEEE Trans. Plasma Sci.; (United States) Vol. PS-14:2; ISSN ITPSB
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
ARGON
BEAMS
COLLISIONS
COMPUTERIZED SIMULATION
DEPOSITION
ELECTRIC DISCHARGES
ELECTRIC HEATING
ELECTRON BEAMS
ELECTRON COLLISIONS
ELEMENTS
ENERGY-LEVEL TRANSITIONS
EXCITATION
FLUIDS
GASES
HEATING
HYDRIDES
HYDROGEN COMPOUNDS
JOULE HEATING
LEPTON BEAMS
MATERIALS
MONTE CARLO METHOD
NONMETALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
OSCILLATIONS
PARTICLE BEAMS
PLASMA
PLASMA HEATING
RARE GASES
RESISTANCE HEATING
RF SYSTEMS
SEMICONDUCTOR MATERIALS
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SIMULATION
SPACE DEPENDENCE
TIME DEPENDENCE
360601* -- Other Materials-- Preparation & Manufacture
ARGON
BEAMS
COLLISIONS
COMPUTERIZED SIMULATION
DEPOSITION
ELECTRIC DISCHARGES
ELECTRIC HEATING
ELECTRON BEAMS
ELECTRON COLLISIONS
ELEMENTS
ENERGY-LEVEL TRANSITIONS
EXCITATION
FLUIDS
GASES
HEATING
HYDRIDES
HYDROGEN COMPOUNDS
JOULE HEATING
LEPTON BEAMS
MATERIALS
MONTE CARLO METHOD
NONMETALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
OSCILLATIONS
PARTICLE BEAMS
PLASMA
PLASMA HEATING
RARE GASES
RESISTANCE HEATING
RF SYSTEMS
SEMICONDUCTOR MATERIALS
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SIMULATION
SPACE DEPENDENCE
TIME DEPENDENCE