The RF voltage dependence of the electron sheath heating in low pressure capacitively coupled rf discharges
Conference
·
OSTI ID:212988
- Universitaet Bochum (Germany)
In low pressure capacitively coupled RF discharges two competitive electron heating mechanisms have been discussed for some time now. At low pressures the stochastic sheath heating and for somewhat higher pressures the Joule heating in the bulk plasma have been proposed. When the pressure is increased at constant RF current density a transition from concave electron distribution functions (EDF) with a pronounced cold electron group to convex EDFs with a missing strong population of cold electrons is found. This transition was interpreted as the transition from dominant stochastic to dominant Joule heating. However, a different interpretation has been given by Kaganovich and Tsendin, who attributed the concave shaped EDFs to the spatially inhomogeneous RF field in combination with the nonlocality of the EDF.
- OSTI ID:
- 212988
- Report Number(s):
- CONF-950749--
- Country of Publication:
- United States
- Language:
- English
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