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Influence of isochronal annealing on superconducting properties, electrical resistivity, and irradiation behavior of amorphous (Mo/sub 0. 6/Ru/sub 0. 4/) /sub 82/B/sub 18/ films

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.94456· OSTI ID:5834833
Thin amorphous films of the superconducting metallic glass (Mo/sub 0.6/ Ru/sub 0.4/) /sub 82/B/sub 18/ were annealed for 1 h at various temperatures T/sub A/ up to 650 /sup 0/C. The structural relaxation caused by the isochronal annealing well below the crystallization temperature leads to a decrease of the critical temperature T/sub c/ and to an increase of the electrical resistivity rho. Subsequently the films were irradiated with high energetic sulphur ions below 30 K. It is shown that the structural effects induced by the heat treatment are opposite to the irradiation effects and can be reversed by the ion irradiation. After high dose irradiation the saturation values of rho and T/sub c/ indicate that the structural states of the amorphous films are identical for all samples independently of the initial stage of relaxation. The experimental results confirm our former interpretation of the irradiation effects in this compound as a smearing of the structure factor S(k).
Research Organization:
Physikalisches Institut, Universitaet Erlangen-Nuernberg, Erwin-Rommel-Stresse 1, D-8520 Erlangen, Federal Republic of Germany
OSTI ID:
5834833
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 43:8; ISSN APPLA
Country of Publication:
United States
Language:
English