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Scaling of the ( radical 3 times radical 3 ) R 30 degree domain-size distribution with coverage for Ag/Si(111)

Journal Article · · Physical Review Letters; (USA)
;  [1]
  1. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6024 (US)

The evolution of the ({radical}3 {times} {radical}3 ){ital R}30{degree} domain-size distribution with coverage for Ag on Si(111) has been studied by high-resolution low-energy electron diffraction. Scaling of the size distribution, which can be fitted by a gamma distribution, is observed. A temperature dependence of the exponent {ital n} describing a power growth law for mean size versus coverage is found where {ital n} decreases with decreasing deposition temperature. By introducing a simple relation, {ital q}+{ital nd}=1, where the dimensionality {ital d}=2 and {ital q} is an exponent describing the power law for domain density versus coverage, the behavior of {ital n} is explained in terms of the experimentally observed behavior of {ital q}.

DOE Contract Number:
AC05-84OR21400
OSTI ID:
5814611
Journal Information:
Physical Review Letters; (USA), Journal Name: Physical Review Letters; (USA) Vol. 66:17; ISSN PRLTA; ISSN 0031-9007
Country of Publication:
United States
Language:
English