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Title: CoSm-based high-coercivity thin films for longitudinal recording

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.348118· OSTI ID:5812785
;  [1]
  1. ECE Department, Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213-3890 (US)

In order to produce thin media with high intrinsic coercivity, we studied a number of CoSm films produced by rf-diode sputtering. We determined an optimized set of sputtering parameters for films sputtered both on glass and NiP-coated Al substrates with and without Cr underlayers. While the coercivity of the films depended strongly on argon pressure, the {l angle}110{r angle} texture of the Cr underlayer remained unaffected by it. The {l angle}110{r angle} texture of Cr changed to {l angle}200{r angle} texture at temperatures {ge}300 {degree}C, and the coercivity of the film was significantly reduced. Under optimal conditions we obtained intrinsic coercivities {gt}2400 Oe for films with thickness {lt}20 nm.

DOE Contract Number:
FG02-90ER45423
OSTI ID:
5812785
Journal Information:
Journal of Applied Physics; (USA), Vol. 69:8; ISSN 0021-8979
Country of Publication:
United States
Language:
English