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Ion dose dependence of the sputtering yield of Ru(0001) at very low fluences

Journal Article · · Phys. Rev. Lett.; (United States)
The neutral sputtered flux from a Ru single crystal oriented along the (0001) axis has been determined as a function of primary ion dose in real time using nonresonant photoionization techniques coupled with time-of-flight mass spectrometry. The data reveal, surprisingly, that the sputtering yield is twice as large from an undamaged surface as that from a slightly damaged surface. The sputtering yield decreases until steady state is reached at a primary ion fluence of only 2/times/10/sup 15/ ions cm/sup /minus/2/. Data analysis results in an estimated cross section for damage of (2.7/plus minus/1.0)/times/10/sup /minus/15/ cm/sup 2/.
Research Organization:
Materials Science and Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois 60439 (US); Department of Chemistry, Surface Science Center, University of Pittsburgh, Pittsburgh, Pennsylvania 15260
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
5806948
Journal Information:
Phys. Rev. Lett.; (United States), Journal Name: Phys. Rev. Lett.; (United States) Vol. 63:5; ISSN PRLTA
Country of Publication:
United States
Language:
English