Ion dose dependence of the sputtering yield: Ar{sup +}, Ne{sup +}, and Xe{sup +} bombardment of Ru(0001) and Al(111)
- Argonne National Lab., IL (United States)
- Univ. of Pittsburgh, PA (United States)
The sputtering yield from clean metal surfaces has long been considered to be insensitive to primary ion dose at moderate ion fluences (< 10{sup 18} ions/cm{sup 2}). Using carefully cleaned and well-characterized targets, the ion dose dependence of the sputtering yield of Ru(0001) and Al(111) has been investigated. The sputtering yield of Ru(0001) is found to decrease substantially following primary ion bombardment at low fluences, while the sputtering yield of Al(111) exhibits no fluence dependence at low primary ion dose. Using secondary neutral mass spectrometry (SNMS), the sputtering yield of ruthenium was observed to decrease following ion bombardment by argon, xenon, and neon. High-detection-efficiency time-of-flight mass spectrometry was coupled with nonresonant laser ionization to allow real-time sputtering yield measurements and to minimize target damage during data collection. The experiments show that the sputtering yield of Ru(0001) decreases by 50%, following a primary ion fluence of, less than 10{sup 16} ions/cm{sup 2} for sputtering by either argon or neon ions and by 25%, following primary ion fluences of less than 10{sup 14} ions/cm{sup 2} for sputtering by xenon. The small size of the experimentally determined damage cross section suggests that microscopic changes in the surface structure cause the observed sputtering yield depression. In contrast to the ruthenium results, the sputtering yield of Al(111) appears to be insensitive to primary ion fluence at low fluences. Calculations using the TRansport of Ions in Matter (TRIM) Monte Carlo sputtering simulation were carried out to investigate the effect of primary ion implantation upon the sputtering yield of ruthenium as well as the effect of a reduced surface binding energy of ruthenium surface atoms. The TRIM results indicate that neither of these mechanisms can explain the experimentally observed fluence dependence of the sputtering yield of ruthenium.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-31109-ENG-38
- OSTI ID:
- 10141730
- Report Number(s):
- ANL/CHM/PP-75303; ON: DE94009816; TRN: 94:004592
- Resource Relation:
- Other Information: PBD: [1994]
- Country of Publication:
- United States
- Language:
- English
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