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Low-temperature process for the preparation of high T/sub c/ superconducting thin films

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98904· OSTI ID:5798974
We have established the low-temperature process for the preparation of high T/sub c/ superconducting films by rf magnetron sputtering. The films were deposited at a temperature (650 /sup 0/C) lower than the tetragonal-orthorhombic transition point with sufficient crystallizing and oxidizing conditions. The as-deposited Er-Ba-Cu-O film on MgO exhibited a sharp superconductive transition with zero resistance at 86 K. This process prevented diffusion at the film and substrate interface and reduced the porous structure in the films.
Research Organization:
Central Research Laboratories, Matsushita Electric Industrial Co., Ltd., Moriguchi, Osaka 570, Japan
OSTI ID:
5798974
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 51:26; ISSN APPLA
Country of Publication:
United States
Language:
English