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Ion backscattering from layered targets

Journal Article · · AIP Conf. Proc.; (United States)
DOI:https://doi.org/10.1063/1.34417· OSTI ID:5798347
The reflection of H atoms from amorphous layered targets were studied using a new version of the computer simulation code MARLOWE. Targets with low Z overlayers on high Z substrates, and vice versa, were investigated using normally incident atoms in the energy range from 0.01 to 1 keV. For very low energies, the backscattering is characteristic of the surface overlayer; at higher energies, which depend on the overlayer thickness, it becomes characteristic of the underlying substrate. In addition to the particle and energy reflection coefficients, the reflected atom energy distribution and the correlation between the emergent energy and angle have been examined.
Research Organization:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37830
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
5798347
Report Number(s):
CONF-831180-
Journal Information:
AIP Conf. Proc.; (United States), Journal Name: AIP Conf. Proc.; (United States) Vol. 111:1; ISSN APCPC
Country of Publication:
United States
Language:
English