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Photoelectron spectroscopic study of bonding in inorganic and organometallic compounds. [Boron trihalides; silyl amines; thiazyl fluorides; borane adducts; transition metal complexes with isocyanides and olefins]

Technical Report ·
OSTI ID:5786880
The gas-phase x-ray photoelectron spectra of boron trihalides, silyl amines, and thiazyl fluorides were obtained. It was found that the order of pi stabilization in the boron trihalides is BF/sub 3/ > BCl/sub 3/ greater than or equal to BBr/sub 3/ > BI/sub 3/. The nitrogen lone-pair orbitals of trisilylamine and tris(trimethyl)silylamine were about 1 eV more stable than a hypothetical nonbonded nitrogen lone pair, indicating N p pi ..-->.. Si d pi bonding. Sulfur d orbital participation is needed to rationalize the corrected ionization potentials of NSF and NSF/sub 3/. The charge distributions and atomic orbital character of NSF and NSF/sub 3/ were obtained. The same technique was used to study sigma and pi interactions in borane adducts of CO and CNCH/sub 3/, iron tetracarbonyl olefin complexes, and transition metal complexes of isocyanides. Borane to carbon monoxide pi bonding is important in BH/sub 3/CO, and the increase in C--O and C--N bond strength observed when BH/sub 3/CO and BH/sub 3/CNCH/sub 3/ form borane adducts is due to rehybridization of the sigma orbitals on carbon. The equatorially coordinated ethylene ligand of Fe(CO)/sub 4/C/sub 2/H/sub 4/ is a better pi acceptor of electron density from the equatorial metal orbitals than the CO ligand it replaced, but a poorer pi acceptor to the Fe d/sub xz/, d/sub yz/ orbitals. By comparing the bonding of CNCH/sub 3/ to CO in Fe(CO)/sub 4/CNCH/sub 3/, it was shown that CNCH/sub 3/ is a weaker sigma donor and pi acceptor than CO in this complex, and that filled pi orbital interactions are relatively more important for CNCH/sub 3/ than for CO.
Research Organization:
Lawrence Berkeley Lab., CA (USA)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
5786880
Report Number(s):
LBL-19459; ON: DE85011975
Country of Publication:
United States
Language:
English