Heat flux measurements on ceramics with thin film thermocouples

Conference · Mon Nov 01 04:00:00 EST 1993

OSTI ID:5785140

Holanda, R; Anderson, R C; Liebert, C H

Two methods were devised to measure heat flux through a thick ceramic using thin film thermocouples. The thermocouples were deposited on the front and back face of a flat ceramic substrate. The heat flux was applied to the front surface of the ceramic using an arc lamp Heat Flux Calibration Facility. Silicon nitride and mullite ceramics were used; two thicknesses of each material were tested, with ceramic temperatures to 1500 C. Heat flux ranged from 0.05-2.5 MW/m2[sup 2]. One method for heat flux determination used an approximation technique to calculate instantaneous values of heat flux vs time; the other method used an extrapolation technique to determine the steady state heat flux from a record of transient data. Neither method measures heat flux in real time but the techniques may easily be adapted for quasi-real time measurement. In cases where a significant portion of the transient heat flux data is available, the calculated transient heat flux is seen to approach the extrapolated steady state heat flux value as expected.

• Research Organization: National Aeronautics and Space Administration, Cleveland, OH (United States). Lewis Research Center
• OSTI ID: 5785140
• Report Number(s): N-94-11310; NASA-TM--106305; E--7963; NAS--1.15:106305; CONF-931127--; CNN: RTOP 505-62-50
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
FILMS
HEAT FLUX
INORGANIC ION EXCHANGERS
ION EXCHANGE MATERIALS
MATERIALS
MEASURING INSTRUMENTS
MINERALS
MULLITE
NITRIDES
NITROGEN COMPOUNDS
OXIDE MINERALS
PHYSICAL PROPERTIES
PNICTIDES
SILICON COMPOUNDS
SILICON NITRIDES
TEMPERATURE RANGE
TEMPERATURE RANGE 0273-0400 K
TEMPERATURE RANGE 0400-1000 K
TEMPERATURE RANGE 1000-4000 K
THERMAL CONDUCTIVITY
THERMOCOUPLES
THERMODYNAMIC PROPERTIES
THIN FILMS