Surface and interface analysis of GaAs--oxyfluorides
Journal Article
·
· J. Vac. Sci. Technol., A; (United States)
AES, XPS, and SIMS analysis of the plasma grown oxyfluorides on GaAs are presented. These data indicate that the films are composed of three basic layers. Region 1 is a mixed As/sub 2/O/sub 3/, Ga/sub 2/O/sub 3/ glass with low concentrations of fluorine. In the second region, fluorine concentrations increase and a shoulder on the As-3d and Ga-3d peaks are observed. As/sub 2/O/sub 3/ and Ga/sub 2/O/sub 3/ are still the major constituents of the film. At the interface between the oxyfluoride glass and the substrate is a thin metallic As region. The difference between pure oxides and this oxyfluoride is the incorporation of fluorine in the films and lower concentrations of metallic As at the interface.
- Research Organization:
- SERI, Golden, Colorado 80401
- DOE Contract Number:
- AC02-77CH00178
- OSTI ID:
- 5784954
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 1:2; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360602* -- Other Materials-- Structure & Phase Studies
ANNEALING
ARSENIC COMPOUNDS
ARSENIC OXIDES
ARSENIDES
AUGER ELECTRON SPECTROSCOPY
CHALCOGENIDES
CHEMICAL ANALYSIS
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELEMENTS
FILMS
FLUORINE
FLUORINE COMPOUNDS
FLUORINE OXIDES
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GALLIUM OXIDES
HALOGEN COMPOUNDS
HALOGENS
HEAT TREATMENTS
INTERFACES
ION MICROPROBE ANALYSIS
IONIZING RADIATIONS
LAYERS
MASS SPECTROSCOPY
MICROANALYSIS
NONDESTRUCTIVE ANALYSIS
NONMETALS
OXIDATION
OXIDES
OXYFLUORIDES
OXYGEN COMPOUNDS
PASSIVATION
PHASE STUDIES
PHOTOELECTRON SPECTROSCOPY
PNICTIDES
RADIATIONS
SPECTROSCOPY
SPUTTERING
SURFACES
X RADIATION
360602* -- Other Materials-- Structure & Phase Studies
ANNEALING
ARSENIC COMPOUNDS
ARSENIC OXIDES
ARSENIDES
AUGER ELECTRON SPECTROSCOPY
CHALCOGENIDES
CHEMICAL ANALYSIS
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELEMENTS
FILMS
FLUORINE
FLUORINE COMPOUNDS
FLUORINE OXIDES
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GALLIUM OXIDES
HALOGEN COMPOUNDS
HALOGENS
HEAT TREATMENTS
INTERFACES
ION MICROPROBE ANALYSIS
IONIZING RADIATIONS
LAYERS
MASS SPECTROSCOPY
MICROANALYSIS
NONDESTRUCTIVE ANALYSIS
NONMETALS
OXIDATION
OXIDES
OXYFLUORIDES
OXYGEN COMPOUNDS
PASSIVATION
PHASE STUDIES
PHOTOELECTRON SPECTROSCOPY
PNICTIDES
RADIATIONS
SPECTROSCOPY
SPUTTERING
SURFACES
X RADIATION