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U.S. Department of Energy
Office of Scientific and Technical Information

Amorphous silicon technology-1989

Conference ·
OSTI ID:5779828
 [1];  [2];  [3];  [4];  [5]
  1. Glasstech Solar, Inc., Wheat Ridge, CO (USA)
  2. Xerox Palo Alto Research Center, CA (USA)
  3. Utah Univ., Salt Lake City, UT (USA)
  4. Osaka Univ. (Japan)
  5. Dundee Univ. (UK)
These proceedings contain papers on film growth; on fundamental studies of structural, electronic and optical properties; on devices such as thin film transistors, solar cells, photoreceptors and particle detectors; on amorphous semiconducting alloys; on stability of materials and devices; and on multilayers and interfaces.
OSTI ID:
5779828
Report Number(s):
CONF-890426--; ISBN: 1-55899-022-4
Country of Publication:
United States
Language:
English