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Synthesis of metastable A-15 ''Nb/sub 3/Si'' by ion implantation and on its superconducting transition temperature

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.327358· OSTI ID:5774051
The authors have found a new technique for the synthesis of metastable compounds of well-defined composition: namely, ion implantation of a selected element into the desired crystal structure. (M.T. Clapp and R.M. Rose, Appl. Phys. Lett. 33, 205 (1978)). Starting with a substrate material of A-15 Nb/sub 3/Al/sub 0.9/Si/sub 0.1/, two basic approaches were tried towards the formation of A-15 Nb/sub 3/Si by Si implantation: (1) direct replacement of the Al by Si and (2) implantation into a surface layer depleted of Al. This latter approach proved to be the most successful. It consisted of removing the Al by a diffusion anneal and replacing the Al deficiency by sequential Si implantations. Upon subsequent heat treatment a surface layer of A-15 Nb/sub 3/Al/sub 0.2/Si/sub 0.8/ was produced. Details of the experimental procedure and a discussion of the superconducting transition temperature measurements of the implanted surfaces are presented.
Research Organization:
Mechanical Engineering Department, University of Massachusetts, Amherst, Massachusetts 01003
OSTI ID:
5774051
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 51:1; ISSN JAPIA
Country of Publication:
United States
Language:
English