Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Effect of heavy dose implantations of B and C on the crystal structure and superconducting transition temperature of A-15 Nb/sub 3/Al

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.333076· OSTI ID:5560442
The effect of ion implantation on metastable phase formation and superconducting transition temperature (T/sub c/) has been investigated. The particular alloys studied were Nb/sub 3/Al/sub 1-x/B/sub x/ and Nb/sub 3/Al/sub 1-x/C/sub x/. A-15 Nb/sub 3/Al was used as the substrate material. Large doses of B and C (up to 23 at.%) were implanted into Al depleted surfaces. A series of implantation energies and doses was chosen to maintain the (Al+B) and (Al+C) concentrations equal to 25 at. %. This is necessary for achieving high T/sub c/ materials. Auger analysis indicated that there was very good agreement between experimental and theoretical dopant profiles immediately after implantation. After annealing up to 900 /sup 0/C the B atoms showed very little redistribution; however the C atoms tended to migrate towards the surface. Structural analysis using a READ camera and a diffractometer indicated that the large doses of B and C had been implanted into the A-15 structure without affecting its stability; this A-15 phase remained stable up to 950 /sup 0/C. Implantation caused the lattice parameter of the A-15 phase to increase by 1%--2%. There was no increase in the superconducting transition temperature above that of the substrate (18 K). This work is consistent with other studies; implantation has successfully produced metastable phases; however implantation into A-15's has not increased their T/sub c/'s.
Research Organization:
Department of Mechanical Engineering, University of Massachusetts, Amherst, Massachusetts 01003
DOE Contract Number:
AC02-80ER10566
OSTI ID:
5560442
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 55:2; ISSN JAPIA
Country of Publication:
United States
Language:
English